Class 100 Cleanroom
The cleanroom provides an effective environment for photolithography processes and other experiments in which dust particles may affect quality of processed or measured samples.
Mask Aligner and UV Exposure Station
Photolithography equipment used for fabrication of micron sized patterns on photoresist.
Spin-Coater/Hotplate System
This benchtop spin-coater and hotplate system can be readily used for the routine fabrication of thin film patterns.
Ion Milling
This dry etching method can be routinely used for creating thin film patterns down to the nanoscale.